JPS5637694B2 - - Google Patents
Info
- Publication number
- JPS5637694B2 JPS5637694B2 JP5733878A JP5733878A JPS5637694B2 JP S5637694 B2 JPS5637694 B2 JP S5637694B2 JP 5733878 A JP5733878 A JP 5733878A JP 5733878 A JP5733878 A JP 5733878A JP S5637694 B2 JPS5637694 B2 JP S5637694B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
- H01J37/3045—Object or beam position registration
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Electron Beam Exposure (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5733878A JPS54148483A (en) | 1978-05-15 | 1978-05-15 | Automatic detecting method for reference mark of exposure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5733878A JPS54148483A (en) | 1978-05-15 | 1978-05-15 | Automatic detecting method for reference mark of exposure |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS54148483A JPS54148483A (en) | 1979-11-20 |
| JPS5637694B2 true JPS5637694B2 (en]) | 1981-09-02 |
Family
ID=13052773
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5733878A Granted JPS54148483A (en) | 1978-05-15 | 1978-05-15 | Automatic detecting method for reference mark of exposure |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS54148483A (en]) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57205388U (en]) * | 1981-06-25 | 1982-12-27 | ||
| JPS6428164U (en]) * | 1987-08-12 | 1989-02-17 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61268052A (ja) * | 1984-11-06 | 1986-11-27 | Nec Corp | 半導体ウエハ−におけるレ−ザトリミング方法 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5423219B2 (en]) * | 1971-11-10 | 1979-08-11 | ||
| US3900737A (en) * | 1974-04-18 | 1975-08-19 | Bell Telephone Labor Inc | Electron beam exposure system |
| JPS5128385A (ja) * | 1974-09-02 | 1976-03-10 | Nippon Keibi Hosho Kk | Jidoshokasochi |
| JPS51118968A (en) * | 1975-04-11 | 1976-10-19 | Toshiba Corp | Electron beam exposure device |
-
1978
- 1978-05-15 JP JP5733878A patent/JPS54148483A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57205388U (en]) * | 1981-06-25 | 1982-12-27 | ||
| JPS6428164U (en]) * | 1987-08-12 | 1989-02-17 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS54148483A (en) | 1979-11-20 |